Wright Center for Photovoltaics Innovation and Commercialization

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Ultrasonic Spray Deposition in a Controlled Environment

  Current Students: Zhaoning Song ( PhD )

Associated Faculty: Michael J. Heben , Adam B. Phillips 

  deposition 2
The aerosol ultrasonic spray system is enclosed in a nitrogen-filled plastic glove box with gas circulator and purifier, as shown in the images. Semiconductor thin film can be deposited uniformly by spraying aqueous or non-aqueous precursor ink onto a heated substrate. The deposition process was well controlled using software and circuitry developed in-house. In our lab, the system is mainly used for Cu chalcogenide thin films (CIGS/CZTS), but it can also deposit other films, such as CdS, In2S3, ZnS, ZnO and SnOx.
Last Updated: 6/26/15